Temperature dependence of the quantum yields for the photolysis of NO2 near the dissociation limit

Coleen M. Roehl, John J. Orlando, Geoffrey S. Tyndall, Richard E. Shetter, Gabriel J. Vázquez, Christopher A. Cantrell, Jack G. Calvert

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Abstract

Photolysis quantum yields for NO2 + hv → O(3P) + NO are reported for the wavelength range 388-411 nm at two temperatures (248 and 298 K). At room temperature, the quantum yield is found to be (0.93 ± 0.10) from 388 to 398 nm and to decrease smoothly to a value of 0.12 at 411 nm. Beyond the dissociation threshold (397.9 nm), quantum yields obtained at 248 K are found to be significantly lower than those at 298 K (by ≈10% at 400 nm and ≈50% at 411 nm). The observed quantum yield data beyond the thermodynamic threshold are explained quantitatively in terms of a mechanism involving both direct dissociation (through the use of internal rovibrational energy) and dissociation of excited NO2 induced by collisions with the bath gas.

Original languageEnglish
Pages (from-to)7837-7843
Number of pages7
JournalJournal of Physical Chemistry
Volume98
Issue number32
DOIs
StatePublished - 1994

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