Temperature dependence of the quantum yields for the photolysis of NO2 near the dissociation limit

  • Coleen M. Roehl
  • , John J. Orlando
  • , Geoffrey S. Tyndall
  • , Richard E. Shetter
  • , Gabriel J. Vázquez
  • , Christopher A. Cantrell
  • , Jack G. Calvert

Research output: Contribution to journalArticlepeer-review

49 Scopus citations

Abstract

Photolysis quantum yields for NO2 + hv → O(3P) + NO are reported for the wavelength range 388-411 nm at two temperatures (248 and 298 K). At room temperature, the quantum yield is found to be (0.93 ± 0.10) from 388 to 398 nm and to decrease smoothly to a value of 0.12 at 411 nm. Beyond the dissociation threshold (397.9 nm), quantum yields obtained at 248 K are found to be significantly lower than those at 298 K (by ≈10% at 400 nm and ≈50% at 411 nm). The observed quantum yield data beyond the thermodynamic threshold are explained quantitatively in terms of a mechanism involving both direct dissociation (through the use of internal rovibrational energy) and dissociation of excited NO2 induced by collisions with the bath gas.

Original languageEnglish
Pages (from-to)7837-7843
Number of pages7
JournalJournal of Physical Chemistry
Volume98
Issue number32
DOIs
StatePublished - 1994

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